Functional thin films produced by plasma techniques - de Almeida Vieira Rogerio

Name: Functional thin films produced by plasma techniques - de Almeida Vieira Rogerio
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Current technological applications of materials are vast, especially metals coated with nitride films. In recent years, a lot of research has been carried out with the aim of optimizing the adhesion of these films to steel substrates in order to broaden their field of applications. Nitride films composed of metallic cations, especially titanium, zirconium, chromium and aluminum, have proven to be of great interest in applications where surface hardness, corrosion resistance and shear strength are required. However, the adhesion of these films has been the main limitation for tribological applications that require high surface mechanical stress. This work proposes the study of techniques for diluting the film/substrate interface by: i) thermally activated diffusion or interdiffusion and ii) gradually varying the chemical composition of the film-substrate interface (functional films). The films and interfaces formed between TiN and AlN films and AISI M2 and AISI D6 steel substrates were studied.

EAN: 9786207619740

Kod produktu

621GQR03527KS

Rok wydania

2024

Strony

108

Format

15.2x22.9cm

Język

angielski

Autorzy

de Almeida Vieira Rogerio